Thesis presented January 13, 2012

Abstract:
We studied the structural and optical properties of III-nitride heterostructures. The growth were achieved by plasma-assisted molecular beam epitaxy. The study was particularly focused on structures emitting in the UV range at sub-300 nm wavelengths. To achieve this wavelength using two-dimensional layers, it is necessary to use ternary AlGaN alloys with high Al content (above 50%). So we first correlated the results of characterization techniques to growth conditions. As a result, we find that it is possible to partially control the alloy homogeneity with the growth temperature and metal/nitrogen flux ratio. Then, we tried to apply these results to AlGaN/AlGaN quantum well heterostructures . On the other hand, we have made digital alloys (short-period GaN/AlN quantum well superlattices). They appeared as an interesting alternative to 2D layers for the realization of light emitting devices. Finally, an important part of the manuscript focuses on studying the effects of post growth annealing, at high temperature. This study was conducted on AlGaN layers and on GaN/AlN quantum dots. For AlGaN layers, we found an increase in the inhomogeneity of the alloy after annealing at 950 °C. For GaN quantum dots, a blue shift of the luminescence is observed for annealig temperature as low as 1000 °C. At 1300-1500 ° C, TEM images clearly showed the diffusion of Ga in the AlN matrix above the quantum dots.

Keywords:
Nitride, MBE, AlGaN, Quantum dots, Semiconductor

On-line thesis. ​